Keep in mind that when 10nm was in planning, EUV light sources looked very exotic relative to current tech, and even though we can see in hindsight that the tech works it is still expensive to operate -- TSMC's wafer costs increased 2x-3x for EUV nodes. If I was running Intel and my engineers told me that they thought they could extend the runway for DUV lithography for a node or two without sacrificing performance or yields, I'd take that bet in a heartbeat. Continuing to commit resources to 10nm DUV for years after it didn't pan out and competitors moved on to smaller nodes just reeks of sunk-cost fallacy, though.

had the issue that they tied their chip designs to specific nodes.

In fairness to Intel, every modern semi design house has that same issue: a chip is designed and laid out for a specific node, so this isn't really a failing so much as a how-it-works.

Of course, Intel was being very, very, very risky when they were designing for a process that basically didn't exist assuming that hey, they'll have it done by the time the design work is complete and they're RTM.

couldnt just take the design and use it on a different node without a lot of effort

Which is what they had to do once they failed to ship newer nodes on schedule with the new CPU designs, and well, we see how that ultimately cost them a whole hell of a lot, if not ultimately their entire business.